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metadata.artigo.dc.title: Boron and nitrogen impurities in SiC nanowires
metadata.artigo.dc.creator: Oliveira, I. S. Santos de
Miwa, R. H.
metadata.artigo.dc.publisher: American Physical Society Feb-2009
metadata.artigo.dc.identifier.citation: OLIVEIRA, I. S. S. de; MIWA, R. H. Boron and nitrogen impurities in SiC nanowires. Physical Review B, Condensed Matter and Materials Physics, [S.l.], v. 79, n. 8, Feb. 2009.
metadata.artigo.dc.description.abstract: We have performed a theoretical ab initio study of the B and N impurities in hydrogen-passivated SiC nanowires (NWs). The calculations were performed within the density-functional theory, and using norm-conserving pseudopotentials to describe the electron-ion interactions. We have considered SiC nanowires growth along the [100] and [111] directions. For B-doped SiC NWs, our results indicate that the atomic relaxations around the impurity site play an important role to the energetic preference of B atoms occupying the Si sites ( B Si ) at the NW surface. The formation of B C becomes energetically more favorable than B Si only at the Si-rich condition. On the other hand, even at the Si-poor condition, the formation of N Si is not expected to occur, N C being the energetically more favorable configuration. In particular for the C-coated SiC NW growth along the [100] direction and the SiC NW growth along the [111] direction, the N C atoms are energetically more stable at the inner sites of the NWs. Thus, indicating that in those systems the N C atoms do not segregate toward the NW surface.
metadata.artigo.dc.language: en_US
Appears in Collections:DFI - Artigos publicados em periódicos

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