Artigo
An ab initio investigation of Bi2Se3 topological insulator deposited on amorphous SiO2
Carregando...
Notas
Data
Orientadores
Editores
Coorientadores
Membros de banca
Título da Revista
ISSN da Revista
Título de Volume
Editor
IOP Publishing
Faculdade, Instituto ou Escola
Departamento
Programa de Pós-Graduação
Agência de fomento
Tipo de impacto
Áreas Temáticas da Extenção
Objetivos de Desenvolvimento Sustentável
Dados abertos
Resumo
Abstract
We use first-principles simulations to investigate the topological properties of Bi2Se3 thin films
deposited on amorphous SiO2, Bi2Se3/a-SiO2, which is a promising substrate for topological
insulator (TI) based device applications. The Bi2Se3 films are bonded to a-SiO2 mediated by
van der Waals interactions. Upon interaction with the substrate, the Bi2Se3 topological surface
and interface states remain present, however the degeneracy between the Dirac-like cones is
broken. The energy separation between the two Dirac-like cones increases with the number
of Bi2Se3 quintuple layers (QLs) deposited on the substrate. Such a degeneracy breaking is
caused by (i) charge transfer from the TI to the substrate and charge redistribution along the
Bi2Se3 QLs, and (ii) by deformation of the QL in contact with the a-SiO2 substrate. We also
investigate the role played by oxygen vacancies (VO) on the a-SiO2, which increases the energy
splitting between the two Dirac-like cones. Finally, by mapping the electronic structure of
Bi2Se3/a-SiO2, we found that the a-SiO2 surface states, even upon the presence of VO, play a
minor role on gating the electronic transport properties of Bi2Se3.
Descrição
Área de concentração
Agência de desenvolvimento
Palavra chave
Marca
Objetivo
Procedência
Impacto da pesquisa
Resumen
Palavras-chave
ISBN
DOI
Citação
OLIVEIRA, I. S. S. de; SCOPEL, W. L.; MIWA, R. H. An ab initio investigation of Bi2Se3 topological insulator deposited on amorphous SiO2. Journal of Physics: Condensed Matter, Bristol, v. 29, n. 4, 2016. doi: 10.1088/1361-648X/29/4/045302.
