Artigo

A new paradigm for Continuous Forest Inventory in industrial plantations

Carregando...
Imagem de Miniatura

Notas

Orientadores

Editores

Coorientadores

Membros de banca

Título da Revista

ISSN da Revista

Título de Volume

Editor

Elsevier

Faculdade, Instituto ou Escola

Departamento

Programa de Pós-Graduação

Agência de fomento

Tipo de impacto

Áreas Temáticas da Extenção

Objetivos de Desenvolvimento Sustentável

Dados abertos

Resumo

Abstract

In contrast to the conventional approach of using measured yields for independent variables in a double sampling estimator, a new estimator is presented for Continuous Forest Inventory (CFI) with partial replacement that is based on projected yields for independent variables. This proposed approach requires a modern growth and yield system for prediction and projection at the stand-level. Other attributes, such as trees per hectare and basal area per hectare are indirectly derived from the Sampling with Partial Replacement (SPR) estimator, together with a consistent stand-table of tree frequency at the diameter class level. The method is extended to stratified sampling and can accommodate cases in which the sample size of permanent plots for a stand is less than 10. Recommendations are provided about the plot size and plot configurations for temporary plots with the aim of establishing procedures that are fast, easy to measure, and inexpensive. It is demonstrated that the proposed sampling estimator can also be extended to some well-known plantation species where the silvicultural practice of thinning is common.

Descrição

Área de concentração

Agência de desenvolvimento

Palavra chave

Marca

Objetivo

Procedência

Impacto da pesquisa

Resumen

ISBN

DOI

Citação

MCTAGUE, J. P.; SCOLFORO, H. F.; SCOLFORO, J. R. S. A new paradigm for Continuous Forest Inventory in industrial plantations. Forest Ecology and Management, [S.l.], v. 519, p. 1-10, Sept. 2022. DOI: 10.1016/j.foreco.2022.120314.

Link externo

Avaliação

Revisão

Suplementado Por

Referenciado Por